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Tailoring mechanical properties and electrical conductivity of flexible niobium carbide nanocomposite thin films

机译:调整柔性的机械性能和导电性   碳化铌纳米复合薄膜

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摘要

Flexible NbC nanocomposite thin films with carbon content ranging from 0 to99 at.% were deposited at room temperature on Si (100) and polystyrenesubstrates by non-reactive magnetron sputtering from pure Nb and C targetswithout applying bias voltage to the substrates. HRTEM images reveal that thefilms exhibit a nanocomposite structure consisting of NbC nanocrystals (2 to 15nm in size) embedded in an amorphous carbon matrix. By simply adjusting the Nbflux in the plasma, we can monitor the nanocrystal size and the percent offree-carbon phase in the films, which in turn allows for the tailoring of bothmechanical properties and electric conductivity of the films. It was found thatthe films composed of ~8-10% free-carbon exhibited a relative high hardness andelastic recovery, around 23 GPa and 85%, respectively, and an electricalconductivity of 2.2x106 S/m at 22C. This study indicates the potential of thisnon-reactive sputtering approach in depositing hard, elastic and electricallyconductive nanocomposite films at low temperatures, which is especially usefulfor preparation of films on temperature sensitive polymers or plasticsubstrates for nano- and micro- electronics applications.
机译:室温下,通过非反应磁控溅射从纯Nb和C靶上向碳(0)到99 at。%的碳含量范围从Nb和C靶上沉积柔性碳NbC纳米复合薄膜,而不向其施加偏压。 HRTEM图像显示,薄膜表现出由嵌入无定形碳基质中的NbC纳米晶体(尺寸为2至15nm)组成的纳米复合结构。通过简单地调节等离子体中的Nbflux,我们可以监测薄膜中的纳米晶体尺寸和游离碳相的百分比,从而可以调整薄膜的机械性能和电导率。发现由约8-10%的游离碳组成的薄膜表现出相对较高的硬度和弹性回复率,分别约为23 GPa和85%,在22℃时的电导率为2.2x106 S / m。这项研究表明,这种非反应溅射方法在低温下沉积硬,弹性和导电的纳米复合薄膜的潜力,对于在纳米和微电子应用的温度敏感聚合物或塑料基板上制备薄膜特别有用。

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